A new technical paper, “Amido-Amine Co(II) Precursor-Based Atomic/Molecular Layer Deposition Processes for Cobalt-Organic Thin Films and Their Thermal Conversion to CoO Thin Films,” was published by ...
Inductively coupled plasma (ICP) sources were first developed decades ago, with regular use in the semiconductor industry at a time when plasma sources primarily deposited silicon oxide and silicon ...
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