Electron lithography enables sub-100-nanometer patterning of a fully water-based hydrogel resist.
The Elionix ELS-G100 electron beam lithography system produces a highly stable beam with a diameter as small 1.8nm, using acceleration voltages of up to 100kV and high beam currents. This allows fine ...
Learn more about the polymer film that can change color and texture when electron beams are applied.
The groundbreaking discovery could open new doors for other researchers working with delicate materials such as cell membranes. (Nanowerk News) Imagine drawing on something as delicate as a living ...
TOKYO--(BUSINESS WIRE)--Advantest Corporation (TSE: 6857, NYSE: ATE) May 19, 2015 - Leading semiconductor equipment supplier Advantest Corporation announces that imec has selected its leading-edge ...