Nikon plans to introduce a new ArF immersion lithography system platform in fiscal year 2028 (April 2028 - March 2029) that offers compatibility with ASML equipment, marking a strategic move to ...
During TSMC's conference held in Taipei on April 20, 2023, institutional investors made their inquisition on whether the cost and yield of the Fab 21 plant under construction in Arizona, US will drag ...
To make smaller transistors so chips can pack more gates and deliver higher performance, lithography must use shorter light wavelengths to form the smaller features. To that end, developments to ...
Lithography tools account for a significant portion of chipmakers' capital expenditures, with EUV platforms exceeding $150 million in price. ASML's immersion lithography tools allowed the company to ...
SAN JOSE, Calif. — The IBM-led ''fab club'' said that it is planning to insert immersion lithography at the 45-nm node, but the group will not deploy high-k dielectrics for gate-stack applications ...
Taiwan Semiconductor Manufacturing Co. (TSMC) has nearly finished perfecting a new chip making technique designed to extend the life of current factory equipment even as it builds ever more intricate ...
ASML is still the dominating market leader of lithography systems, more than 8x larger than the second largest player. The company derives 37% of its revenue from DUV systems with 68% of DUV revenues ...
ALMADEN, Calif. — Despite its decision to pass on 157-nm lithography at the 45-nm node, Intel Corp. is “keeping all of its options open” for the 32-nm node, including 193-immersion lithography and 157 ...
M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results